LC

Luoqi Chen

AB Asml Netherlands B.V.: 2 patents #110 of 517Top 25%
Overall (2016): #120,650 of 481,213Top 30%
2
Patents 2016

Issued Patents 2016

Patent #TitleCo-InventorsDate
9372957 Three-dimensional mask model for photolithography simulation Peng Liu, Yu Cao, Jun Ye 2016-06-21
9262579 Integration of lithography apparatus and mask optimization process with multiple patterning process Jun Ye, Hong Chen 2016-02-16