Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9275865 | Plasma treatment of film for impurity removal | Benjamin C. Wang, Michael S. Jackson, Avgerinos V. Gelatos, Amit Khandelwal | 2016-03-01 |
| 9245769 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | David T. Or, Mei Chang | 2016-01-26 |