Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9245769 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | Joshua Collins, Mei Chang | 2016-01-26 |
DO
David T. Or
Overall (2016): #423,979 of 481,213Top 90%
1
Patents 2016