TA

Toshiaki Akutsu

HC Hitachi Chemical Company: 3 patents #10 of 201Top 5%
Overall (2016): #52,323 of 481,213Top 15%
3
Patents 2016

Issued Patents 2016

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
9346977 Abrasive, abrasive set, and method for abrading substrate Hisataka Minami, Tomohiro Iwano, Koji Fujisaki 2016-05-24
9346978 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate Tomohiro Iwano, Hisataka Minami, Koji Fujisaki 2016-05-24
9293344 Cmp polishing slurry and method of polishing substrate Masato Fukasawa, Naoyuki Koyama, Yasushi Kurata, Kouji Haga, Yuuto Ootsuki 2016-03-22