NK

Naoyuki Koyama

HC Hitachi Chemical Company: 1 patents #61 of 201Top 35%
Overall (2016): #280,909 of 481,213Top 60%
1
Patents 2016

Issued Patents 2016

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9293344 Cmp polishing slurry and method of polishing substrate Masato Fukasawa, Yasushi Kurata, Kouji Haga, Toshiaki Akutsu, Yuuto Ootsuki 2016-03-22