MF

Masato Fukasawa

HC Hitachi Chemical Company: 2 patents #23 of 201Top 15%
Overall (2016): #119,442 of 481,213Top 25%
2
Patents 2016

Issued Patents 2016

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9299573 Polishing method Kouji Mishima, Masaya Nishiyama 2016-03-29
9293344 Cmp polishing slurry and method of polishing substrate Naoyuki Koyama, Yasushi Kurata, Kouji Haga, Toshiaki Akutsu, Yuuto Ootsuki 2016-03-22