Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9447306 | CMP polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material | Hisataka Minami, Keisuke Inoue, Chisato KIKKAWA, Yutaka Nomura | 2016-09-20 |
| 9346977 | Abrasive, abrasive set, and method for abrading substrate | Hisataka Minami, Toshiaki Akutsu, Koji Fujisaki | 2016-05-24 |
| 9346978 | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate | Hisataka Minami, Toshiaki Akutsu, Koji Fujisaki | 2016-05-24 |