Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9482952 | Composition for forming topcoat layer and resist pattern formation method employing the same | Tetsuo Okayasu, Georg Pawlowski, Takafumi KINUTA | 2016-11-01 |
| 9298095 | Rinse solution for lithography and pattern formation method employing the same | Georg Pawlowski, Yuriko Matsuura | 2016-03-29 |