| 9499721 |
Colloidal silica chemical-mechanical polishing composition |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-11-22 |
| 9434859 |
Chemical-mechanical planarization of polymer films |
Sudeep Pallikkara Kuttiatoor, Renhe Jia |
2016-09-06 |
| 9422457 |
Colloidal silica chemical-mechanical polishing concentrate |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
| 9422456 |
Colloidal silica chemical-mechanical polishing composition |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
| 9340706 |
Mixed abrasive polishing compositions |
Brian Reiss, Jakub W. Nalaskowski, Viet Lam, Renhe Jia |
2016-05-17 |
| 9309442 |
Composition for tungsten buffing |
Lin Fu, Steven Grumbine |
2016-04-12 |
| 9303190 |
Mixed abrasive tungsten CMP composition |
William Ward, Glenn Whitener, Steven Grumbine |
2016-04-05 |
| 9303189 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
| 9303188 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
| 9281210 |
Wet-process ceria compositions for polishing substrates, and methods related thereto |
Brian Reiss, Sairam Shekhar |
2016-03-08 |
| 9238754 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-01-19 |