Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8048325 | Method and apparatus for multilayer photoresist dry development | Koichiro Inazawa, Rie Inazawa, Rich Wise, Arpan Mahorawala, Siddhartha Panda | 2011-11-01 |
| 7998872 | Method for etching a silicon-containing ARC layer to reduce roughness and CD | Vinh Luong, Masaru Nishino | 2011-08-16 |