Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062829 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | Mitsuhiro Hata, Yusuke Fuji | 2011-11-22 |
| 8062830 | Chemically amplified positive resist composition | Yusuke Fuji, Junji Shigematsu, Nobuo Ando, Ichiki Takemoto | 2011-11-22 |
| 8057983 | Chemically amplified positive resist composition | Yusuke Fuji, Junji Shigematsu, Nobuo Ando, Ichiki Takemoto | 2011-11-15 |
| 8003296 | Chemically amplified positive resist composition | Masahiko Shimada, Kazuhiko Hashimoto, Junji Shigematsu, Satoshi Yamamoto | 2011-08-23 |