Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062829 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | Yusuke Fuji, Takayuki Miyagawa | 2011-11-22 |
| 8048612 | Polymer and chemically amplified resist composition comprising the same | Yusuke Fuji | 2011-11-01 |
| 7985529 | Mask patterns including gel layers for semiconductor device fabrication | Hyun-Woo Kim, Jung-hwan Hah, Sang-Gyun Woo | 2011-07-26 |
| 7981985 | Polymer and chemically amplified resist composition comprising the same | Yusuke Fuji | 2011-07-19 |