Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062829 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | Mitsuhiro Hata, Takayuki Miyagawa | 2011-11-22 |
| 8062830 | Chemically amplified positive resist composition | Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto | 2011-11-22 |
| 8057983 | Chemically amplified positive resist composition | Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto | 2011-11-15 |
| 8048612 | Polymer and chemically amplified resist composition comprising the same | Mitsuhiro Hata | 2011-11-01 |
| 7981985 | Polymer and chemically amplified resist composition comprising the same | Mitsuhiro Hata | 2011-07-19 |