Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8040489 | Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid | Katsushi Nakano, Masahiko Okumura, Takeyuki Mizutani, Tomoharu Fujiwara | 2011-10-18 |