Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8010222 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2011-08-30 |
| 7940386 | Scatterometry target employing non-periodic defect features to enhance or optimize target sensitivity to a parameter of interest | — | 2011-05-10 |
| 7933016 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanevsky, Michael Friedmann, Ian Smith +10 more | 2011-04-26 |
| 7873504 | Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout | — | 2011-01-18 |