Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8075800 | Polishing slurry and polishing method | Youichi Machii, Masato Yoshida, Masato Fukasawa, Toranosuke Ashizawa | 2011-12-13 |
| 8002860 | CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive | Kouji Haga, Masato Yoshida, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii | 2011-08-23 |