MY

Masato Yoshida

HC Hitachi Chemical Company: 5 patents #3 of 170Top 2%
AD Advantest: 1 patents #37 of 142Top 30%
DE Denso: 1 patents #343 of 1,195Top 30%
Overall (2011): #7,845 of 364,097Top 3%
7
Patents 2011

Issued Patents 2011

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8075800 Polishing slurry and polishing method Naoyuki Koyama, Youichi Machii, Masato Fukasawa, Toranosuke Ashizawa 2011-12-13
8002860 CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive Naoyuki Koyama, Kouji Haga, Keizou Hirai, Toranosuke Ashizawa, Youiti Machii 2011-08-23
7991547 In-vehicle information apparatus and in-vehicle navigation apparatus for high altitude applications Makoto Tanaka 2011-08-02
7963825 Abrasive, method of polishing target member and process for producing semiconductor device Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more 2011-06-21
7898733 Laser oscillator Kazunori Shiota, Shin Masuda, Masataka Nakazawa 2011-03-01
7871308 Abrasive, method of polishing target member and process for producing semiconductor device Toranosuke Ashizawa, Hiroki Terazaki, Yuuto Ootuki, Yasushi Kurata, Jun Matsuzawa +1 more 2011-01-18
7867303 Cerium oxide abrasive and method of polishing substrates Toranosuke Ashizawa, Hiroki Terazaki, Yasushi Kurata, Jun Matsuzawa, Kiyohito Tanno +1 more 2011-01-11