LC

Luoqi Chen

AB Asml Netherlands B.V.: 2 patents #76 of 377Top 25%
📍 Saratoga, CA: #155 of 561 inventorsTop 30%
🗺 California: #7,487 of 41,698 inventorsTop 20%
Overall (2011): #83,314 of 364,097Top 25%
2
Patents 2011

Issued Patents 2011

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
8065636 System and method for creating a focus-exposure model of a lithography process Jun Ye, Yu Cao, Hua-Yu Liu 2011-11-22
7873937 System and method for lithography simulation Jun Ye, Yen-Wen Lu, Yu Cao, Xun Chen 2011-01-18