HL

Hua-Yu Liu

AB Asml Netherlands B.V.: 1 patents #144 of 377Top 40%
📍 San Jose, CA: #1,637 of 4,297 inventorsTop 40%
🗺 California: #14,783 of 41,698 inventorsTop 40%
Overall (2011): #282,025 of 364,097Top 80%
1
Patents 2011

Issued Patents 2011

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
8065636 System and method for creating a focus-exposure model of a lithography process Jun Ye, Yu Cao, Luoqi Chen 2011-11-22