KW

Kurt E. Wampler

AB Asml Masktools B.V.: 4 patents #3 of 12Top 25%
📍 Sunnyvale, CA: #133 of 1,815 inventorsTop 8%
🗺 California: #2,795 of 41,698 inventorsTop 7%
Overall (2011): #25,153 of 364,097Top 7%
4
Patents 2011

Issued Patents 2011

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
8039180 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2011-10-18
7998355 CPL mask and a method and program product for generating the same Douglas Van Den Broeke, Jang Fung Chen 2011-08-16
7985515 Method and apparatus for performing model-based layout conversion for use with dipole illumination Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran 2011-07-26
7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2011-02-22