Issued Patents 2011
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8040573 | Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration | Xuelong Shi, Douglas Van Den Broeke | 2011-10-18 |
| 8039180 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2011-10-18 |
| 7998355 | CPL mask and a method and program product for generating the same | Douglas Van Den Broeke, Kurt E. Wampler | 2011-08-16 |
| 7985515 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Noel Corcoran | 2011-07-26 |
| 7981576 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke | 2011-07-19 |
| 7892703 | CPL mask and a method and program product for generating the same | Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jung Chul Park, Thomas Laidig | 2011-02-22 |
| 7892707 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2011-02-22 |