Issued Patents 2011
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8039397 | Using optical metrology for within wafer feed forward process control | Jeffrey Drue David, Harry Q. Lee, Boguslaw A. Swedek, Zhize Zhu, Wen-Chiang Tu | 2011-10-18 |
| 8014004 | Determining physical property of substrate | Abraham Ravid, Boguslaw A. Swedek, Jeffrey Drue David, Jun Qian, Ingemar Carlsson +2 more | 2011-09-06 |
| 7998358 | Peak-based endpointing for chemical mechanical polishing | Bogdan Swedek, David J. Lischka | 2011-08-16 |
| 7952708 | High throughput measurement system | Abraham Ravid, Boguslaw A. Swedek, Jeffrey Drue David, Jun Qian, Sidney P. Huey +3 more | 2011-05-31 |
| 7942724 | Polishing pad with window having multiple portions | Boguslaw A. Swedek, Jimin Zhang | 2011-05-17 |
| 7938714 | Polishing pad assembly with glass or crystalline window | Jeffrey Drue David, Bogdan Swedek | 2011-05-10 |
| 7931522 | Removable optical monitoring system for chemical mechanical polishing | Jeffrey Drue David, Bogdan Swedek | 2011-04-26 |