KM

Koumei Matsuzava

TL Tokyo Electron Limited: 1 patents #112 of 433Top 30%
IBM: 1 patents #1,781 of 5,214Top 35%
Overall (2005): #156,056 of 245,428Top 65%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6924223 Method of forming a metal layer using an intermittent precursor gas flow process Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Mitsuhiro Tachibana +6 more 2005-08-02