Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6953654 | Process and apparatus for removing a contaminant from a substrate | Nicholas Alan Ryza | 2005-10-11 |
| 6928746 | Drying resist with a solvent bath and supercritical CO2 | Chantal Arena-Foster, Nicholas Alan Ryza, Paul Schilling | 2005-08-16 |
| 6924086 | Developing photoresist with supercritical fluid and developer | Chantal Arena-Foster, Nicholas Alan Ryza, Paul Schilling | 2005-08-02 |