Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6967168 | Method to repair localized amplitude defects in a EUV lithography mask blank | Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi | 2005-11-22 |
| 6875543 | Etched-multilayer phase shifting masks for EUV lithography | John S. Taylor | 2005-04-05 |