WC

Wen-Kung Cheng

TSMC: 1 patents #198 of 851Top 25%
📍 Gongguan, TW: #3 of 15 inventorsTop 20%
Overall (2005): #78,461 of 245,428Top 35%
1
Patents 2005

Issued Patents 2005

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6903019 CMP process leaving no residual oxide layer or slurry particles Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Ming-Hua Yoo +1 more 2005-06-07