Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6914007 | In-situ discharge to avoid arcing during plasma etch processes | Chao-Cheng Chen, Tsang-Jiuh Wu, Hui Yu, Hun-Jan Tao | 2005-07-05 |
| 6884728 | Method for removing polymeric residue contamination on semiconductor feature sidewalls | Jun-Lung Huang, Jen-Cheng Liu, Yi-Chen Huang, Yin-Shen Chu, Hong-Ming Chen +1 more | 2005-04-26 |