Issued Patents 2005
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6966822 | System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control | Jiro Kajiwara, Gerard Moloney, Huey-Ming Wang, David A. Hansen | 2005-11-22 |
| 6887132 | Slurry distributor for chemical mechanical polishing apparatus and method of using the same | Jiro Kajiwara, Gerard Moloney, Jun Liu, Junsheng Yang, Ernesto Saldana +1 more | 2005-05-03 |