Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6899997 | Process for modifying resist structures and resist films from the aqueous phase | Siew Siew Yip, Jörg Rottstegge, Gertrud Falk, Michael Sebald, Kerstin Seibold +1 more | 2005-05-31 |
| 6887653 | Method for structuring a photoresist layer | Michael Sebald | 2005-05-03 |
| 6841332 | Photoresist compound and method for structuring a photoresist layer | Gertrud Falk, Eberhard Kuehn, Michael Sebald | 2005-01-11 |