Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828226 | Removal of SiON residue after CMP | Kei-Wei Chen, Kuo-Hsiu Wei, Yu-Kin Lin, Ting-Chun Wang, Ying-Lang Wang | 2004-12-07 |
| 6769959 | Method and system for slurry usage reduction in chemical mechanical polishing | Kei-Wei Chen, Ting-Chun Wang, Yu-Ku Lin, Ying-Lang Wang, Ming-Wen Chen +1 more | 2004-08-03 |