Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835507 | Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare | Seong-woon Choi, Tae-Moon Jeong, Shun-Yong Zinn, Woo-Sung Han, Jung Min Sohn | 2004-12-28 |
| 6775815 | Exposure method for correcting line width variation in a photomask | Seung-hune Yang, Ji-Hyeon Choi | 2004-08-10 |
| 6689520 | Exposure method for correcting dimension variation in electron beam lithography | — | 2004-02-10 |