Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828080 | Pattern forming method and method of fabricating device | — | 2004-12-07 |
| 6811939 | Focus monitoring method, focus monitoring system, and device fabricating method | Yuki Miyamoto, Shinroku Maejima | 2004-11-02 |
| 6797443 | Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device | Yuki Miyamoto, Naohisa Tamada | 2004-09-28 |
| 6764794 | Photomask for focus monitoring | Yuki Miyamoto, Naohisa Tamada, Shinroku Maejima | 2004-07-20 |
| 6743554 | Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device | — | 2004-06-01 |
| 6709792 | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | — | 2004-03-23 |
| 6706453 | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | — | 2004-03-16 |