Issued Patents 2004
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6759337 | Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate | Sheldon Aronowitz, Valeriy Sukharev, John Haywood, Helmut Puchner, Ravindra M. Kapre +1 more | 2004-07-06 |