Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6759337 | Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate | Sheldon Aronowitz, Valeriy Sukharev, John Haywood, James Kimball, Helmut Puchner +1 more | 2004-07-06 |
| 6747318 | Buried channel devices and a process for their fabrication simultaneously with surface channel devices to produce transistors and capacitors with multiple electrical gate oxides | Tommy Hsiao, Yanhua Wang, Kyungjin Min | 2004-06-08 |