Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6821864 | Method to achieve increased trench depth, independent of CD as defined by lithography | Kevin K. Chan, Gangadhara S. Mathad, Rajiv Ranade | 2004-11-23 |
| 6809005 | Method to fill deep trench structures with void-free polysilicon or silicon | Rajiv Ranade, Gangadhara S. Mathad, Kevin K. Chan | 2004-10-26 |