Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800416 | Negative deep ultraviolet photoresist | Munirathna Padmanaban, Ralph R. Dammel, Medhat A. Touky | 2004-10-05 |
| 6737492 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski | 2004-05-18 |
| 6723488 | Photoresist composition for deep UV radiation containing an additive | Ralph R. Dammel, Munirathna Padmanaban | 2004-04-20 |