Issued Patents 2004
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800415 | Negative-acting aqueous photoresist composition | Ping-Hung Lu, Mark Neisser, Hengpeng Wu | 2004-10-05 |
| 6800416 | Negative deep ultraviolet photoresist | Takanori Kudo, Munirathna Padmanaban, Medhat A. Touky | 2004-10-05 |
| 6737215 | Photoresist composition for deep ultraviolet lithography | Raj Sakamuri | 2004-05-18 |
| 6723488 | Photoresist composition for deep UV radiation containing an additive | Takanori Kudo, Munirathna Padmanaban | 2004-04-20 |
| 6686429 | Polymer suitable for photoresist compositions | Raj Sakamuri | 2004-02-03 |