Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6654106 | Methods and apparatus for determining blur of an optical system | — | 2003-11-25 |
| 6642532 | Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery | — | 2003-11-04 |
| 6635881 | Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same | Atsushi Yamada, Hiroyasu Simizu | 2003-10-21 |
| 6566663 | Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations | Shinichi Kojima, Katsushi Nakano, Kazuya Okamoto | 2003-05-20 |
| 6531251 | Proximity effect correction methods | — | 2003-03-11 |
| 6507027 | Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations | Shinichi Kojima | 2003-01-14 |