Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6657207 | Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures | Teruaki Okino, Kazuaki Suzuki, Noriyuki Hirayanagi | 2003-12-02 |
| 6620558 | Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion | — | 2003-09-16 |