Issued Patents 2003
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6657207 | Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures | Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki | 2003-12-02 |
| 6632722 | Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same | Tomoharu Fujiwara | 2003-10-14 |
| 6627906 | Control of exposure in charged-particle-beam microlithography based on beam-transmissivity of the reticle | — | 2003-09-30 |
| 6627905 | Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor | — | 2003-09-30 |
| 6627903 | Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same | — | 2003-09-30 |
| 6521900 | Alignment marks for charged-particle-beam microlithography, and alignment methods using same | — | 2003-02-18 |
| 6522519 | Electrostatic chucking device and methods for holding microlithographic sample | — | 2003-02-18 |