Issued Patents 2003
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE38282 | Process for using bilayer photoresist | Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff | 2003-10-21 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | Phillip Brock, Hiroshi Ito, Gregory Michael Wallraff | 2003-08-26 |
| 6525153 | Polycyclic polymers containing pendant cyclic anhydride groups | Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Juliann Opitz +1 more | 2003-02-25 |