Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran | 2003-11-25 |
| RE38282 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Ratnam Sooriyakumaran | 2003-10-21 |
| 6627111 | Organic light emitting displays and new fluorescent compounds | Sally A. Swanson | 2003-09-30 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | Robert David Allen, Phillip Brock, Hiroshi Ito | 2003-08-26 |
| 6548219 | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions | Hiroshi Ito, Phillip Brock | 2003-04-15 |
| 6509134 | Norbornene fluoroacrylate copolymers and process for the use thereof | Hiroshi Ito, Dolores Carlotta Miller, Phillip Brock | 2003-01-21 |