Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Gregory Michael Wallraff | 2003-11-25 |
| RE38282 | Process for using bilayer photoresist | Robert David Allen, Donald C. Hofer, Gregory Michael Wallraff | 2003-10-21 |