Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6653048 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff | 2003-11-25 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | Robert David Allen, Hiroshi Ito, Gregory Michael Wallraff | 2003-08-26 |
| 6548219 | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions | Hiroshi Ito, Gregory Michael Wallraff | 2003-04-15 |
| 6509134 | Norbornene fluoroacrylate copolymers and process for the use thereof | Hiroshi Ito, Dolores Carlotta Miller, Gregory Michael Wallraff | 2003-01-21 |