Issued Patents 2003
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6602728 | Method for generating a proximity model based on proximity rules | Lars Liebmann, Scott M. Mansfield | 2003-08-05 |
| 6596442 | Asymmetric halftone biasing for sub-grid pattern adjustment | Richard A. Ferguson, Lars Liebmann | 2003-07-22 |
| 6578190 | Process window based optical proximity correction of lithographic images | Richard A. Ferguson, Mark A. Lavin, Lars Liebmann | 2003-06-10 |
| 6563566 | System and method for printing semiconductor patterns using an optimized illumination and reticle | Alan E. Rosenbluth, Scott Bukofsky | 2003-05-13 |
| 6553559 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Lars Liebmann, Scott M. Mansfield | 2003-04-22 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Scott M. Mansfield, Timothy A. Brunner, James A. Culp | 2003-04-01 |
| 6526164 | Intelligent photomask disposition | Scott M. Mansfield | 2003-02-25 |
| 6525818 | Overlay alignment system using polarization schemes | Xiaoming Yin, Tim Wiltshire, Don Wheeler | 2003-02-25 |
| 6511791 | Multiple exposure process for formation of dense rectangular arrays | Scott Bukofsky, Gerhard Kunkel, Richard J. Wise | 2003-01-28 |