Issued Patents 2003
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6602728 | Method for generating a proximity model based on proximity rules | Lars Liebmann, Alfred Wong | 2003-08-05 |
| 6553559 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Lars Liebmann, Alfred Wong | 2003-04-22 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Timothy A. Brunner, James A. Culp, Alfred Wong | 2003-04-01 |
| 6526164 | Intelligent photomask disposition | Alfred Wong | 2003-02-25 |