SW

Shumin Wang

CM Cabot Microelectronics: 5 patents #1 of 26Top 4%
📍 Beijing, AL: #1 of 1 inventorsTop 100%
Overall (2003): #7,909 of 273,478Top 3%
5
Patents 2003

Issued Patents 2003

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
6646348 Silane containing polishing composition for CMP Steven Grumbine 2003-11-11
6592776 Polishing composition for metal CMP Steven Grumbine, Christopher C. Streinz, Eric W. G. Hoglund 2003-07-15
6582623 CMP composition containing silane modified abrasive particles Steven Grumbine, Christopher C. Streinz 2003-06-24
6569350 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Rodney Kistler 2003-05-27
6541434 Cleaning solution for semiconductor surfaces following chemical-mechanical polishing 2003-04-01