Issued Patents 2003
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6620670 | Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 | Jallepally Ravi, Shih-Hung Li, Liang-Yuh Chen | 2003-09-16 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6620670 | Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 | Jallepally Ravi, Shih-Hung Li, Liang-Yuh Chen | 2003-09-16 |