Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6589868 | Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput | — | 2003-07-08 |
| 6559026 | Trench fill with HDP-CVD process including coupled high power density plasma deposition | Zhuang Li, Young Kwang Lee | 2003-05-06 |
| 6559052 | Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures | Zhuang Li, Tzuyuan Yiin | 2003-05-06 |
| 6527910 | Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD | — | 2003-03-04 |
| 6524969 | High density plasma chemical vapor deposition (HDP-CVD) processing of gallium arsenide wafers | Zhuang Li, Tzuyuan Yiin, Lung-Tien Han | 2003-02-25 |
| 6514870 | In situ wafer heat for reduced backside contamination | — | 2003-02-04 |