Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6559052 | Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures | Zhuang Li, Kent Rossman | 2003-05-06 |
| 6524969 | High density plasma chemical vapor deposition (HDP-CVD) processing of gallium arsenide wafers | Zhuang Li, Lung-Tien Han, Kent Rossman | 2003-02-25 |